Session Details
[23a-P07-1~19]6.4 Thin films and New materials
Sat. Mar 23, 2024 9:30 AM - 11:30 AM JST
Sat. Mar 23, 2024 12:30 AM - 2:30 AM UTC
Sat. Mar 23, 2024 12:30 AM - 2:30 AM UTC
P07 (Building No. 9)
[23a-P07-1]First-principles electronic structure analysis of manganese thin films on sapphire
〇(M1)Koki Miyazaki1, Masao Obata1, Tatsuki Oda1 (1.Kanazawa Univ.)
[23a-P07-2]Effects of film formation conditions on magnetic phase transition of FeRh alloy thin films
〇Masafumi Fukuzumi1 (1.Hyogo Prefectural Institute of Technology)
[23a-P07-3]Growth of single-crystalline ZnO layer by UHV sputter epitaxy method (II)
〇Haruto Ikeda1, Ryota Misawa1, Koki Kamo1, Taichi Kojima1, Keisuke Yoshida1, Hiroyuki Shinoda1, Nobuki Mutsukura1 (1.School of Engineering, Tokyo Denki Univ.)
[23a-P07-4]Growth of hexagonal and cubic GaN layers by UHV sputter epitaxy method
〇Syuto Mine1, Riku Nagayama1, Seita Koga1, Yasuki Sawada1, Kosuke Teshiba1, Haruki Nakagawa1, Keisuke Yoshida1, Hiroyuki Shinoda1, Nobuki Mutsukura1 (1.School of Engineering, Tokyo Denki University)
[23a-P07-5]Fabrication of SiN thin film by evaporation method
〇Koichi Muro1, Akira Mochiduki2, Wataru Kanazawa3 (1.Teikyo Univ., 2.Taishou Optical., 3.Sanwa Kenma, Ltd.)
[23a-P07-6]Non-stoichiometric Composition and Electric Properties of ScN Films Prepared by MBE
〇Takeshi Ohgaki1, Isao Sakaguchi1, Naoki Ohashi1 (1.NIMS)
[23a-P07-7]Evaluation of Electrical Conduction Characteristics of Field Effect Transistors Using MXene Thin Films
〇Yasuyuki Sainoo1, Md Nasiruddin1,2, Tsuyoshi Takaoka1, Saidur Rahman3, Tadahiro Komeda1 (1.IRAM, Tohoku Univ., 2.Chem, Tohoku Univ., 3.Sunway University,)
[23a-P07-8]Relationship between the sputtering power and the properties of RuTe2 thin film
〇(D)SHIHYUAN LI1, Yi Shuang2, Daisuke Ando1, Yuji Sutou1,2 (1.Tohoku Univ., 2.Tohoku Univ. AIMR)
[23a-P07-9]Growth of p-type oxide semiconductor Bi2WO6 by solid-phase reaction
〇Ichiro Takakuwa1, Ryusuke Seino1,2, Seiya Suzuki1, Kenichi Ozawa3, Hiraku Ogino2, Keishi Nishio1, Makoto Minohara2 (1.Tokyo Univ. Sci., 2.AIST, 3.KEK)
[23a-P07-10]Characterization of copper iodide thin films prepared by spin coating method
〇Asahi Yonemoto1, Ryuya Maruyama1, Kazuhiro Gotoh1,2, Atsushi Masuda1,2 (1.Grad. School Sci. Tech., Niigata Univ., 2.IRCNT. Niigata Univ.)
[23a-P07-11]Film growth of NaH using radical hydrogen reactive infrared laser evaporation
〇(M2)Kota Munefusa1, Erika Fukushi1, Takayuki Harada2, Hiroyuki Oguchi1 (1.Shibaura Inst., 2.NIMS)
[23a-P07-12]Challenge to Thin-Film All-Solid-State Li Battery Using LiBH4 Electrolyte
〇(M2)Takumi Tozawa1, Shunsuke Washiya1, Suzuki Soichiro1, Ishida Eri1, Niizuma Ryo1, Iso Keiichiro1, Oguchi Hiroyuki1 (1.Sibaura Tech.)
[23a-P07-13]Study on self-sustained oscillations of planar VO2 device with facing electrodes
–Dependence of oscillation frequency on circuit parameters and temperature –
〇(M1)junpei kidokoro1, Kunio Okimura1, Md. Suruzu Mian2, Tosihiro Nakanisi3 (1.Tokai Unvi., 2.Seikei Unvi., 3.Kyoto Unvi.)
[23a-P07-14]Highly oriented growth of VO2 films on ZnO-nanorod buffered polyimide film and their bending durability
〇(M2)Yukito Ozawa1, Rai Hiranabe2, Shinpei Shimono2, Qinzhi Liu2, Kunio Okimura1,2 (1.Graduate School of Engineering, Tokai Univ., 2.School of Engineering, Tokai Univ.)
[23a-P07-15]Study on non-volatile control in IMT of VO2 films through crystallization and re-amorphization of capping GST layer
〇Takuto Ohnuki1, Yiqi Liu2, Yamato Nawa2, Kunio Okimura1,2, Shoya Inagaki3, Yuji Muraoka4, Joe Sakai5, Masashi Kuwahara6, Aiko Narazaki6 (1.Graduate School of Engineering,Tokai Univ., 2.School of Engineering,Tokai Univ., 3.Okayama Univ., 4.RIIS, Okayama Univ., 5.Toshima Manufacturing Co., Ltd., 6.AIST Institute.)
[23a-P07-16]Reflectance spectra measurement in magnetic garnet thin film by MOD
〇Shun Nakazawa1, Jian Zhang1, Fatima Zahra Chafi1, Masami Nishikawa1, Masami Kawahara2, Takayuki Ishibashi1 (1.Nagaoka Univ. of Tech., 2.Kojundo Chem. Lab.)
[23a-P07-17]Formation method and evaluation of silicone-modified SiO2 film on polycarbonate using LED with wavelength of 265 nm
〇Hidetoshi Nojiri1, Kazufumi Iwai1, Ryosuke Yoshii2 (1.RENIAS, 2.Shin-Etsu Chemical)
[23a-P07-18]Deposition and Characterization of Epitaxial Cr-Doped ITO Films
〇Haruka Kurihara1, Saiki Kitagawa1,2,3, Toshihiro Nakamura1,3 (1.Graduate School of Human and Environmental Studies, Kyoto Univ., 2.JSPS, 3.ILAS, Kyoto Univ.)
[23a-P07-19]3D Thin-Film Metrology using Lateral High Aspect Ratio Test Structures with Advanced Optical Techniques
〇Feng Gao1, Mikko Utriainen1, Jussi Kinnunen1, Wataru Momose2 (1.Chipmetrics Ltd., 2.ALD Japan Inc.)