[23p-12K-1~15] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

2:15 PM - 2:30 PM JST(5:15 AM - 5:30 AM UTC)

[23p-12K-3] Micro/nano laser processing of Si-based nanofilms

〇Yuuki Uesugi¹, Tetsuro Kobayashi¹, Yuichi Kozawa¹, Shinichi Sato¹ (1.Tohoku Univ.)

Keywords:

Laser processing,Suspended film,Femtosecond laser

We will present a new laser processing technique that is capable of processing suspended Si/SiN films with thicknesses of less than 100 nm. Using a femtosecond laser pulse, we can perform hole-drilling of less than 70 nm in diameter and/or patterning processes of several 10 μm square on the films in a single-shot laser processing. High-precision drawing processing is also possible, making this technique ideal for laboratory-scale M/NEMS fabrication.