Presentation Information

[23p-12K-4]Preparation of (001) Single Crystalline Stripes by μCLS using Sputtered Si Films

〇(B)Ryota Nosu1, Wenchang Yeh1 (1.Shimane Univ.)

Keywords:

single crystal,sputtering,silicon

We had succeeded in obtaining (001) single-crystalline Si films on SiO2 by the micro-chevron laser scanning (μCLS) method. However, this Si film was fabricated by CVD method, which is harmful to the raw material gas. Therefore, we changed the Si deposition method to the safe and environmentally friendly sputtering method and attempted (001) single crystal growth.