Presentation Information

3:30 PM - 3:45 PM JST(6:30 AM - 6:45 AM UTC)

[23p-12K-7]SiGe film growth via pulsed laser annealing of screen-printed pastes on Si

〇Takeshi Sato¹, Satoru Miyamoto¹, Shota Suzuki², Hideaki Minamiyama², Marwan Dhamrin^2,3, Noritaka Usami^1,4,5 (1.Grad. Eng., Nagoya Univ., 2.Toyo Aluminium K.K., 3.Osaka. Univ., 4.InFuS, Nagoya Univ., 5.IMaSS, Nagoya Univ.)

Keywords:

Laser annealing,Silicon Germanium,Crystal growth

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