[24a-31B-1~9] 17.3 Layered materials

10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)

[24a-31B-7] Thickness Measurement of PVD-WS₂ Continuous Films by AFM

〇(B)Soma Ito¹, Teraoka Kaede¹, Shinya Imai¹, Naoki Matsunaga¹, Keita Kurohara¹, Kuniyuki Kakushima¹, Hitoshi Wakabayashi¹ (1.Tokyo Tech)

Keywords:

2D materials,TMD,AFM

Measurements of film thickness and surface roughness were conducted on continuous WS₂ films deposited by sputtering on SiO₂ and treated with SVA, using AFM. The dependence of film thickness and surface roughness on deposition time was examined to discuss changes in the growth state.