[24a-61B-1~8] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

9:45 AM - 10:15 AM JST(12:45 AM - 1:15 AM UTC)

[24a-61B-4] [The 45th Best Review Paper Award Speech] Characterization techniques of ion bombardment damage on electronic devices during plasma processing

〇Koji Eriguchi¹ (1.Kyoto Univ.)

Keywords:

plasma,defect creation,electronic device

Plasma processes are widely used in the fabrication of various devices and materials. In contrast, unexpected reaction mechanisms, commonly referred to as plasma process-induced damage (PID), have been pointed out and extensively studied to control the mechanisms. This presentation addresses one of the PID mechanisms, i.e., ion bombardment damage, and discusses characterization methods.