The 71st JSAP Spring Meeting 2024
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Session Details

Oral presentation8 Plasma Electronics : 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[24a-61B-1~8]8.2 Plasma deposition of thin film, plasma etching and surface treatment

Sun. Mar 24, 2024 9:00 AM - 11:30 AM JST
Sun. Mar 24, 2024 12:00 AM - 2:30 AM UTC
61B (Building No. 6)
Noriaki Toyoda(Univ. of Hyogo)
9:00 AM - 9:15 AM JST(12:00 AM - 12:15 AM UTC)

[24a-61B-1]Effect of Gas-mixed Ratio of Plasma-functionalized Isocyanate Groups on Multi-walled Carbon Nanotubes

〇(B)Kakuto Watanabe1, Takahiro Yamaguchi1, Shun Zhou1, Keiji Nakamura1, Hiroki Kondo2, Daisuke Ogawa1 (1.Chubu Univ., 2.Kyushu Univ.)
9:15 AM - 9:30 AM JST(12:15 AM - 12:30 AM UTC)

[24a-61B-2]Reduction Treatment on Gold Surface by Water Vapor Plasma at Low Pressure

〇Hirokazu Terai1, Madoka Tsumaya1, Osamu Tsuji1 (1.Samco Inc.)
9:30 AM - 9:45 AM JST(12:30 AM - 12:45 AM UTC)

[24a-61B-3]Dissimilar material bonding of engineering plastics and metals by surface treatment using atmospheric pressure high-frequency plasma jet

〇Kosuke Takenaka1, Ryosuke Koyari1, Shunsho Shigemori1, Soutaro Nakamoto1, Akiya Jinda1, Susumu Toko1, Giichiro Uchida2, Yuichi Setsuhara1 (1.Osaka Univ., 2.Meijo Univ.)
9:45 AM - 10:15 AM JST(12:45 AM - 1:15 AM UTC)

[24a-61B-4][The 45th Best Review Paper Award Speech] Characterization techniques of ion bombardment damage on electronic devices during plasma processing

〇Koji Eriguchi1 (1.Kyoto Univ.)
10:30 AM - 10:45 AM JST(1:30 AM - 1:45 AM UTC)

[24a-61B-5]Plasma-induced defects ~ SiO2/Si interface defect characterization through RIE-SiO2 process~

〇Shota Nunomura1, Takayoshi Tsutsumi2, Masanaga Fukasawa1, Masaru Hori2 (1.AIST, 2.Naogya Univ.)
10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[24a-61B-6]Effects of Plasma-induced Damage on Viscoelastic Property by Cyclic Nanoindentation

〇Takahiro Goya1, Keiichiro Urabe1, Koji Eriguchi1 (1.Kyoto Univ.)
11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[24a-61B-7]Local realization of substrate bias contribution degree on film properties of carbon hard mask

〇Yusuke Ando1, Hiroki Kondo2, Takayoshi Tsutsumi3, Kenji Ishikawa3, Makoto Sekine3, Masaru Hori3 (1.Nagoya Univ. Eng., 2.Kyushu Univ. ISEE, 3.Nagoya Univ. cLPS)
11:15 AM - 11:30 AM JST(2:15 AM - 2:30 AM UTC)

[24a-61B-8]Time-resolved measurement of negative ion energy distributions in pulsed plasma

〇(M2)Kazuki Toji1, Takayoshi Tsutsumi2, Shih-Nan Hsiao2, Makoto Sekine2, Masaru Hori2, Kenji Ishikawa2 (1.Nagoya Univ., Eng., 2.Center for Low-temperature Plasma Sciences, Nagoya Univ.)
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