3:00 PM - 3:15 PM JST(6:00 AM - 6:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation AwardEnglish Presentation
[24p-12M-8]Optimization of i-a-Si:H passivation process by DC facing target sputtering deposition
〇(D)Shasha Li1, Shinsuke Miyajima1 (1.Tokyo Tech)
Keywords:
amorphous silicon,surface passivation,sputtering
