Presentation Information

[24p-71B-8]14nm MTJ with stacked storage layer for high-density STT-MRAM

〇Masaru Toko1, Hideyuki Sugiyama1, Kamata Chikayoshi1, Itai Shogo1, Takashima Rina1, Takeo Koike1, Nakayama Masahiko1 (1.Kioxia Corp.)

Keywords:

MRAM,High density,storage class memory

We demonstrate a novel 14nm magnetic tunnel junction (MTJ) with high-retention and high-speed writing in Spin-Transfer-Torque (STT) MRAM. We developed Accelerated STT-Switching and High-Retention MTJ (AccelHR-MTJ) using storage layer composed of high-retention doped Co-Pt alloy layer on CoFeB switching accelerating layer. Excellent performances such as high-retention of >10 years at 90℃ and sub-ns high-speed writing were achieved in our 14nm AccelHR-MTJ. This MTJ technology enables high-density, high-speed, and low-cost 14nm STT-MRAM toward storage class memory applications.