Presentation Information
[24p-P08-7]Development of simultaneous measurement for multi-component ions in deep oscillation magnetron sputtering using a reflectron time-of-flight mass spectrometer
〇(B)Hiroki Kobayashi1, Yuki Nakagawa1, Eisuke Yokoyama1, Nobuo Nishimiya1, Masaomi Sanekata1, Masahide Tona2, Hiroaki Yamamoto2, Keizo Tsukamoto2, Kiyokazu Fuke3, Keijiro Ohshima4, Fuminori Misaizu4 (1.Tokyo Polytech Univ., 2.Ayabo Corp., 3.Kobe Univ., 4.Tohoku Univ.)
Keywords:
time-of-flight mass spectrometry,magnetron sputtering
Recently, deep oscillating magnetron sputtering (DOMS) using comb-shaped power waveforms has attracted attention as the next generation of modulated pulse sputtering (MPPMS) with excellent arcing suppression performance despite high power long pulse power input. Currently, DOMS research is concentrating on deposition characteristics, and detailed investigation of the DOMS plasma process is forthcoming.. In this study, we developed a simultaneous multi-component ion measurement system for DOMS produced ions measured by time-of-flight mass spectrometry (TOF-MS) to clarify the time evolution process and energy characteristics of DOMS, and performed time evolution measurements and ion energy distribution measurements were performed on multi-component ion particles. The discharge waveform of each pulse of DOMS for shows different peak positions and waveforms for each component. The result of the time-evolution measurements suggests to reflect differences in the ion-produce process in DOMS.