Presentation Information
[24p-P09-4]Plasma-assisted Reactive Pulsed DC Sputtering for Control of IGZO Thin Film Properties
〇Kosuke Takenaka1, Takumi Ueda1, Susumu Toko1, Akinori Ebe2, Yuichi Setsuhara1 (1.Osaka Univ., 2.EMD Corp.)
Keywords:
oxide semiconductor,IGZO