Session Details
[24p-P09-1~8]8.2 Plasma deposition of thin film, plasma etching and surface treatment
Sun. Mar 24, 2024 4:00 PM - 6:00 PM JST
Sun. Mar 24, 2024 7:00 AM - 9:00 AM UTC
Sun. Mar 24, 2024 7:00 AM - 9:00 AM UTC
P09 (Building No. 9)
[24p-P09-1]Development of Spatially Zero-Dimentional Model of High-Power Impulse Magnetron Sputtering Plasmas
〇Keita Kakinuma1, Motoki Abe1, Takayuki Ohta2, Akinori Oda1 (1.Chiba Inst. Technol., 2.Meijo Univ.)
[24p-P09-2]Fabrication of inplane oriented hydroxyapatite film by RF magnetron sputtering
〇(M1)Tatsuya Ugumori1, Mami Matsukawa1 (1.Doshisha Univ.)
[24p-P09-3]Relationship between deposition mechanisms and target surface using powder targets I
〇Hiroharu Kawasaki1, Takahiko Satake1,2, Shin-ichi Aoqui2, Tamiko Ohshima3 (1.Nat,l Ins. Tech., Sasebo Col., 2.Sojo Univ., 3.Nagasaki Univ.)
[24p-P09-4]Plasma-assisted Reactive Pulsed DC Sputtering for Control of IGZO Thin Film Properties
〇Kosuke Takenaka1, Takumi Ueda1, Susumu Toko1, Akinori Ebe2, Yuichi Setsuhara1 (1.Osaka Univ., 2.EMD Corp.)
[24p-P09-5]Precursor interactions for SiCxNyOz thin film formation by room temperature PECVD
Hiroki Kawakami1, Kenta Hori1, Toru Watanabe1, 〇Hitoshi Habuka1 (1.Yokohama Nat. Univ.)
[24p-P09-6]Effects of gas pressure on deposition characteristics of hydrogenated amorphous carbon films using CxHy + Ar plasma CVD
〇(M2)Shinjiro Ono1, Manato Eri1, Takamasa Okumura1, Naoto Yamashita1, Kunihiro Kamataki1, Naho Itagaki1, Kazunori Koga1, Masaharu Shiratani1 (1.Kyushu Univ.)
[24p-P09-7]Investigation of Isocyanate Groups on the Top Surface of Multi-walled Carbon Nanotubes Functionalized with Low-temperature Plasma
〇Shogo Maehara1, Kakuto Watanabe1, Keiji Nakamura1, Hiroki Kondo2, Daisuke Ogawa1 (1.Chubu Univ., 2.Kyushu Univ.)
[24p-P09-8]Cryo etching of SiN by electronic excitation of NF3 and SF6 condensed layers
〇Kazuki Ozawa1, Ryusei Watanabe1, Tomoki Yamada1, Tetsuya Sato1 (1.univ. of yamanashi)