[24p-P09-1~8] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[24p-P09-8] Cryo etching of SiN by electronic excitation of NF₃ and SF₆ condensed layers

〇Kazuki Ozawa¹, Ryusei Watanabe¹, Tomoki Yamada¹, Tetsuya Sato¹ (1.univ. of yamanashi)

Keywords:

etching,silicon nitride,NF3