Presentation Information
[24p-P16-25]Effectiveness of Double Depotision for Resistance Reduction of
ZnO Transparent Conductive Films
〇Reisuke Fujita1, Cuzovic Tihomir1, Daiki Ishida2, Kyohei Hosaka2, Naoyuki Sato1 (1.Ibaraki Univ., 2.Ibaraki univ.)
Keywords:
ZnO,Transparent conductive film,double deposition
As an alternative material for transparent conductive films, we focused on ZnO because it is inexpensive and has a low optical absorption coefficient even in the near-infrared region, and we are developing ZnO using a radio frequency (RF) inductively coupled plasma (ICP) method with a high deposition rate. Using the ion plating method (approximately 1 µm/min), we synthesized a ZnO thin film with low resistance similar to ITO. While we are working on increasing the thickness of ZnO thin films in order to lower their sheet resistance RS, we used double deposition as one of the methods. As a result, a value lower than the original RS and close to the theoretical trend of parallel combined resistance was obtained, so this new deposition method is effective for reducing the resistance and increasing the functionality of transparent conductive films in the future. It is thought that.