[25a-12J-1~11] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

9:00 AM - 9:15 AM JST(12:00 AM - 12:15 AM UTC)

[25a-12J-1] Mechanism for improving narrow space loading using organic solvents

〇Yuki Yoshida¹, Takeo Nakano², Sangita Kumari³, Shan Hu³, Peter Delia³ (1.TEL kyushu, 2.TEL Technology Solutions, 3.TEL Technology Center, America)

Keywords:

wet etching,narrow space

The etching rate for narrow spaces relative to wide spaces was slower for aqueous solvents and faster for organic solvents. Differences in molecular distribution and diffusion state within the space were determined by MD calculation. Based on the calculation results, We considered factors other than the EDL model.