[25a-12M-1~11] 7.2 Applications and technologies of electron beams

9:30 AM - 9:45 AM JST(12:30 AM - 12:45 AM UTC)

[25a-12M-3] Dependence of Oxidation Resistance on Nitrogen Compositions of Reactive Sputter-Deposited Hafnium Nitride Thin Films

〇Tomoaki Osumi¹, Masayoshi Nagao², Yasuhito Gotoh¹ (1.Kyoto Univ., 2.AIST)

Keywords:

hafnium nitride,nitrogen composition,oxidation resistance

Hafnium nitride thin films with different nitrogen compositions were deposited by reactive sputtering by controlling the nitrogen gas flow rate. The films were heated at 400℃ in air for 2 hours. The difference in oxygen content near the surface of the films before and after the thermal treatment was evaluated by nuclear resonant scattering analysis. It was found that the film with a higher nitrogen composition showed a lower oxygen peak after the thermal treatment. It was suggested that the film with a higher nitrogen composition has better oxidation resistance.