[25a-21C-1~10] 15.4 III-V-group nitride crystals

11:30 AM - 11:45 AM JST(2:30 AM - 2:45 AM UTC)

[25a-21C-10] Evaluation of GaN film using post-nitridation type sputtering equipment

〇Fuminori Yoda¹, Atsushi Fujita¹, Yoji Takizawa¹, Shigeki Matsunaka¹, Seiya Nishimura², Atsushi Suzuki², Satoshi Kamiyama³ (1.Shibaura mechatronics, 2.E&E Evolution, 3.Meijo Univ.)

Keywords:

gallium nitride,sputtering