Presentation Information

[25a-52A-3]Characterization of GaN vertical JBS diodes fabricated by channeled implantation of Mg ions and ultra-high-pressure annealing

〇Kazuki Kitagawa1, Maciej Matys2, Tsutomu Uesugi2, Tetsu Kachi2, Masahiro Horita1,2, Jun Suda1,2 (1.Nagoya Univ., 2.Nagoya Univ. IMaSS)

Keywords:

Vertical GaN power device,Junction barrier Schottky rectifiers,Ultra high pressure annealing (UHPA)