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9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)

[25a-61A-2]Evaluation of ALD polycrystalline indium oxide films using O₂and H₂O plasma

〇(M1)JONGHO PARK¹, Sota Takahashi¹, Takuya Hoshii¹, Takanori Takahashi², Misa Sunagawa³, Yuki Tsuruma³, Shigekazu Tomai³, Kazuo Tsutsui¹, Hitoshi Wakabayashi¹, Yukiharu Uraoka², Kuniyuki Kakushima¹ (1.Tokyo Tech, 2.NAIST, 3.Idemitsu Kosan Co., Ltd.)

Keywords:

Oxide Semiconductor

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Presentation Information

[25a-61A-2]Evaluation of ALD polycrystalline indium oxide films using O2 and H2O plasma

Keywords:

[25a-61A-2]Evaluation of ALD polycrystalline indium oxide films using O₂and H₂O plasma