[25p-1BJ-1~7] CS.6 Code-sharing Session of 6.1 & 13.3 & 13.5

1:45 PM - 2:00 PM JST(4:45 AM - 5:00 AM UTC)

[25p-1BJ-4] Fabrication of Thin Ferroelectric H_fxAl_1-xO₂ Films by Flash Lamp Annealing (FLA)

〇Yuma Ueno¹, Hideaki Tanimura¹, Naoki Sakamoto², Tomoya Mifune², Shinichi Kato¹, Takumi Mikawa¹, Nakashima Seiji², Hironori Fujisawa² (1.SCREEN Semiconductor Solutions Co., Ltd., 2.University of Hyogo)

Keywords:

Ferroelectric,Flash Lamp Annealing,Low Thermal Budget