[25p-61B-1~9] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

2:15 PM - 2:30 PM JST(5:15 AM - 5:30 AM UTC)

[25p-61B-5] FTIR analysis of carbon films deposited by using tetramethylsilane plasma

Atsuya Kuwada¹, Yuto Oishi¹, Ryohei Higashida², 〇Masanori Shinohara² (1.Grad. schl. of Engineer., Fukuoka Univ., 2.Dep. of Electrical Engineer., Fukuoka Univ.)

Keywords:

Si-DLC,MIR-IRAS,Si-H

Si-DLC has a lot of useful properties. We investigate the deposition process during tetramethylsilane plasma, with multiple-internal-reflection infrared absorption spectroscopy (MIR-IRAS). SiH_X components are not formed in the initial stage but are formed in the latter stage. The bonds in the films are broken by the formation of Si-H. These effects generate various useful properties.