[10a-N323-1~11] 8.1 Plasma production and diagnostics

10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[10a-N323-7] Rotational and vibrational temperatures diagnostics determined on N₂ second positive system in nitrogen plasma generated by plasma-enhanced metal-organic chemical vapor deposition system

〇Yuya Yamashita¹, Tokio Takahashi¹, Tetsuji Shimizu¹, Hisashi Yamada¹ (1.AIST)

Keywords:

optical emission spectroscopy (OES),MOCVD,nitride

In the deposition of nitride semiconductor crystals using plasma-enhanced metal-organic chemical vapor deposition, there is a need to clarify the plasma reaction process. This study aims to clarify the characteristics of a plasma-enhanced metal-organic chemical vapor deposition system for the deposition of nitride semiconductor crystals. The rotational and vibrational temperatures on N₂ second positive system of nitrogen plasma were diagnosed by optical emission spectroscopy. It was revealed that both the rotational and vibrational temperatures decreased with increasing distance from the plasma source.