[10a-N401-1~9] 13.3 Insulator technology

10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)

[10a-N401-8] Insulation and interfacial properties of low temperature sputter HfO2 MOSCAP

〇(M1)Shunsuke Takaki¹, Toshiyuki Yoshida¹, Wenchang Yeh¹ (1.Shimane Univ.)

Keywords:

high-k film,MOS CAP