Presentation Information

[10p-N301-1]Evaluation of the polarity-inverted AlN interface using several oxidation process

〇Tomohiro Tamano1, Ryota Akaike1,2, Hiroki Yasunaga2,3, Takao Nakamura1,2, Zentaro Akase4, Shigetaka Tomiya4, Hideto Miyake1,2 (1.Grad. Sch. of Eng. Mie Univ, 2.IC-SDF MIe Univ., 3.ORIP Mie Univ., 4.NAIST)

Keywords:

Aluminum Nitride,Inversion domain boundaries,Sputtering