[10p-N302-1~11] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

4:00 PM - 4:15 PM JST(7:00 AM - 7:15 AM UTC)

[10p-N302-10] Fabrication of CoSn kagome metal thin films for interconnect applications

〇Tomoya Nakatani¹, Nattamon Suwannaharn¹, Taisuke Sasaki¹ (1.NIMS)

Keywords:

interconnect,kagome metal

Single-crystal thin films of anisotropic conducting material CoSn kagome metal were prepared for interconnect applications, and the anisotropy of resistivity with crystallographic orientation was evaluated. 13 µΩcm in the c-axis direction and 118 µΩcm in the a-axis direction, showing remarkable anisotropy similar to bulk.