[10p-N403-1~11] 7.3 Micro/Nano patterning and fabrication

4:00 PM - 4:15 PM JST(7:00 AM - 7:15 AM UTC)

[10p-N403-10] Fabrication of nano-shaped gold foil using solvent-soluble UV-curable resin

〇TAICHI OGAWA¹, Takeshi Osaki², Yukio Okado², Jun Taniguchi¹ (1.Tokyo Univ. of Sci., 2.Toyo Gosei Co., Ltd.)

Keywords:

resists,UV nanoimprint,molds

UV-Nanoimprint Lithography (UV-NIL) is a nanoimprint lithography (NIL) technique that realizes high-resolution and high-precision pattern formation and plays an important role in the field of semiconductor manufacturing and optical devices. It plays an important role in the fields of semiconductor manufacturing and optical devices. In this study, nano-scale patterns were transferred onto a gold foil by UV-NIL using a solvent-soluble UV-curable resin.