The 86th JSAP Autumn Meeting 2025
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Session Details

Oral presentation7 Beam Technology and Nanofabrication : 7.3 Micro/Nano patterning and fabrication

[10p-N403-1~11]7.3 Micro/Nano patterning and fabrication

Wed. Sep 10, 2025 1:30 PM - 4:30 PM JST
Wed. Sep 10, 2025 4:30 AM - 7:30 AM UTC
N403 (Lecture Hall North)
1:30 PM - 1:45 PM JST(4:30 AM - 4:45 AM UTC)

[10p-N403-1]Research on Resolution of Rough Patterns Printed by Projection Lithography Using Faced Paraboloid Mirrors

〇Toshiyuki Horiuchi1, Jun-ya Iwasaki1, Hiroshi Kobayashi1 (1.Tokyo Denki Univ.)
1:45 PM - 2:00 PM JST(4:45 AM - 5:00 AM UTC)

[10p-N403-2]Effect of Organic Ligand and Metal Core structure on Lithographic Characteristics of Organic-Inorganic Hybrid Resists for EB and EUV Lithography

〇Hiroki Yamamoto1, Yusa Muroya2, Kazumasa Okamoto2, Shuhei Shimoda3, Takahiro Kozawa2 (1.QST, 2.SANKEN Osaka Univ., 3.Hokkaido Univ.)
2:00 PM - 2:15 PM JST(5:00 AM - 5:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[10p-N403-3]Development of Out of Band Reflectometer for EUV Lithography

〇Takumi Nukisato1, Naoki Hayase1, Shinji Yamakawa1, Tetsuo Harada1 (1.Univ. of Hyogo)
2:15 PM - 2:30 PM JST(5:15 AM - 5:30 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[10p-N403-4]Development of Electron Exposure Tool(LEEFET) for EUV Resist Evaluation

〇(M1)Ryuichi YAMASAKI1, Hayase Naoki1, Shinji Yamakawa1, Tetsuo Harada1 (1.University of Hyogo)
2:30 PM - 2:45 PM JST(5:30 AM - 5:45 AM UTC)

[10p-N403-5]Mechanism of Surface Roughness Formation of Resist after Spin Coating on Step Substrates

〇Yasuhiro Shikahama1, Takayoshi Honda1, Yoshiya Hagimoto1, Suguru Shiratori2 (1.Sony Semiconductor Solutions Corp., 2.Tokyo City Univ.)
3:00 PM - 3:15 PM JST(6:00 AM - 6:15 AM UTC)

[10p-N403-6]Direct nano-lithography in Ultrathin Silicon Nanosheets Utilizing Helium Ion Beam Irradiation

〇Yukinori Morita1, Kensuke Inoue2, Ryuichi Sugie2, Shinichi Ogawa1 (1.AIST, 2.TRC)
3:15 PM - 3:30 PM JST(6:15 AM - 6:30 AM UTC)

[10p-N403-7]Molecular dynamics study of early stages of development process for negative type resists in electron beam lithography (2)

〇Kosei Tada1, Ryuki Tanaka1, Hiroto Wakamatsu1, Masaaki Yasuda1 (1.Osaka Met. Univ.)
3:30 PM - 3:45 PM JST(6:30 AM - 6:45 AM UTC)

[10p-N403-8]Development of Molecular Dynamics Simulation of UV Nanoimprint

〇Hiroto Wakamatsu1, Yoshihiko Hirai1, Masaaki Yasuda1 (1.Osaka Metropolitan Univ)
3:45 PM - 4:00 PM JST(6:45 AM - 7:00 AM UTC)

[10p-N403-9]Fabrication of fine metal patterns using solvent-soluble UV-curable resin and lift-off process

〇(M1)Satoshi Fujieda1, Takeshi Osaki2, Yukio Okado2, Jun Taniguchi1 (1.Tokyo Univ. of Sci., 2.Toyo Gosei Co., Ltd)
4:00 PM - 4:15 PM JST(7:00 AM - 7:15 AM UTC)

[10p-N403-10]Fabrication of nano-shaped gold foil using solvent-soluble UV-curable resin

〇TAICHI OGAWA1, Takeshi Osaki2, Yukio Okado2, Jun Taniguchi1 (1.Tokyo Univ. of Sci., 2.Toyo Gosei Co., Ltd.)
4:15 PM - 4:30 PM JST(7:15 AM - 7:30 AM UTC)

[10p-N403-11]Improvement of silver ink transfer process using NIL mold with light shielding film

〇Takumi Ashida1, Jun Taniguchi1 (1.Tokyo Univ. of Sci)
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