[10p-N403-1~11] 7.3 Micro/Nano patterning and fabrication

4:15 PM - 4:30 PM JST(7:15 AM - 7:30 AM UTC)

[10p-N403-11] Improvement of silver ink transfer process using NIL mold with light shielding film

〇Takumi Ashida¹, Jun Taniguchi¹ (1.Tokyo Univ. of Sci)

Keywords:

Nanoimprint,Microstructure formation

Imprint transfer of silver ink for photolithography was performed using an imprint mold with a light-shielding film attached to the convex part of the mold. Among several methods of attaching a light-shielding film to a mold, a mold with a light-shielding film was fabricated by a method that does not use a vacuum. Adhesion of the silver ink used to the substrate was an issue, but a silane coupling treatment was added to the process to improve the adhesion, and a wiring pattern was formed.