Presentation Information
[10p-N403-7]Molecular dynamics study of early stages of development process for negative type resists in electron beam lithography (2)
〇Kosei Tada1, Ryuki Tanaka1, Hiroto Wakamatsu1, Masaaki Yasuda1 (1.Osaka Met. Univ.)
Keywords:
development,resist,lithography
We have been conducting molecular dynamics simulation to reproduce the development process in electron beam lithography for negative resists. In this study, we report the results of analysis focusing on the size dependence of resist molecules and the dispersion dependence of polymerization degree in development. The simulation results show that the number of molecules dissolved by development is greatly reduced with an increase in the polymerization degree of resist molecules. In addition, the results suggest the importance of molecular weight dispersion in development.