[10p-N403-1~11] 7.3 Micro/Nano patterning and fabrication

3:30 PM - 3:45 PM JST(6:30 AM - 6:45 AM UTC)

[10p-N403-8] Development of Molecular Dynamics Simulation of UV Nanoimprint

〇Hiroto Wakamatsu¹, Yoshihiko Hirai¹, Masaaki Yasuda¹ (1.Osaka Metropolitan Univ)

Keywords:

UV nanoimprint,UV curable resin,Molecular Dynamics

<!--StartFragment-->When the pattern size in UV nanoimprint becomes nanoscale, molecular dynamics becomes an effective method for simulation analysis to solve problems such as molding defects, but compared to thermal nanoimprint, there have been few reports of molecular dynamics analysis for UV nanoimprint due to the difficulty of reproducing the UV curing reaction. In this study, we developed a molecular dynamics simulation that reproduces all processes of resin filling, curing, and demolding for UV nanoimprint.<!--EndFragment-->