[10p-N403-1~11] 7.3 Micro/Nano patterning and fabrication

3:45 PM - 4:00 PM JST(6:45 AM - 7:00 AM UTC)

[10p-N403-9] Fabrication of fine metal patterns using solvent-soluble UV-curable resin and lift-off process

〇(M1)Satoshi Fujieda¹, Takeshi Osaki², Yukio Okado², Jun Taniguchi¹ (1.Tokyo Univ. of Sci., 2.Toyo Gosei Co., Ltd)

Keywords:

resists,UV nanoimprint,electron and ion beam lithography

Metal patterns were fabricated using a lift-off process. It enables selective metal removal without etching. In addition, it is a resin that hardens when exposed to UV light was used in the fabrication process, and a soluble UV-curable resin, PAK-YY01 (manufactured by Toyo Synthetic Chemical Co., Ltd.), which can be easily removed with organic solvents. It was used to fabricate fine metal patterns.