[7a-N201-1~10] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)

[7a-N201-6] Growth of α-Ga₂O₃ Films on 2-inch α-Cr₂O₃ Templates by Mist CVD Method

〇Ryuma Iida¹, Kotono Yamada¹, Shiyu Xiao², Kazuto Murakami², Yugo Yamaguchi¹, Soma Nishio¹, Takayosi Onuma¹, Tohru Honda¹, Morimichi Watanabe², Katuhiro Imai², Tomohiro Yamaguchi¹ (1.Kogakuin Univ., 2.NGK INSYLATORS, LTD.)

Keywords:

Ga2O3,Mist CVD Method,2-inch