[7a-P01-1~9] 7 Beam Technology and Nanofabrication (Poster)

[7a-P01-6] Development of Automated Chemical Etching Machine for EUV Multilayer Mirrors

〇(M1)Ryohei Shibata¹, Riku Ogata¹, Yumie Nakagome¹, Mitsunori Toyoda¹ (1.Tokyo Polytechnic Univ.)

Keywords:

Mo/Si multilayer mirror,Extreme Ultraviolet(EUV)

Mo/Si multilayer mirrors used for EUV microscopy have wavefront aberrations due to shape errors of the mirror substrates. We have found a new method to remove the multilayer structure one layer at a time from the top by chemical etching, while maintaining the reflectivity of the Mo/Si multilayer mirror. This method can control the wavefront with 1/100 accuracy compared to surface polishing of the substrate. In this presentation, we will report on the development of an automatic etching machine necessary for the optimization of this method.