Presentation Information
[7a-P01-6]Development of Automated Chemical Etching Machine for EUV Multilayer Mirrors
〇(M1)Ryohei Shibata1, Riku Ogata1, Yumie Nakagome1, Mitsunori Toyoda1 (1.Tokyo Polytechnic Univ.)
Keywords:
Mo/Si multilayer mirror,Extreme Ultraviolet(EUV)
Mo/Si multilayer mirrors used for EUV microscopy have wavefront aberrations due to shape errors of the mirror substrates. We have found a new method to remove the multilayer structure one layer at a time from the top by chemical etching, while maintaining the reflectivity of the Mo/Si multilayer mirror. This method can control the wavefront with 1/100 accuracy compared to surface polishing of the substrate. In this presentation, we will report on the development of an automatic etching machine necessary for the optimization of this method.