[7a-S103-1~7] Atomic Layer Process (ALP) analysis and application technologies (2)

11:50 AM - 12:05 PM JST(2:50 AM - 3:05 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[7a-S103-7] Effect of Ligands of Amino Silane Precursors on SiO₂ Growth

〇(D)Yuuki Tsuchiizu¹, Teruhisa Otsuka², Yamazaki Masashi², Ohori Daisuke¹, Endo Kazuhiko¹ (1.Tohoku Univ., 2.Natl. Inst. of Adv. Ind. Sci. and Tech.)

Keywords:

Amino pricursor,ALD,insitu-XPS