The 86th JSAP Autumn Meeting 2025
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Session Details

Symposium (Oral)Symposium : Atomic Layer Process (ALP) analysis and application technologies (2)

[7a-S103-1~7]Atomic Layer Process (ALP) analysis and application technologies (2)

Sun. Sep 7, 2025 10:00 AM - 12:05 PM JST
Sun. Sep 7, 2025 1:00 AM - 3:05 AM UTC
S103 (Lecture Hall South)
10:00 AM - 10:05 AM JST(1:00 AM - 1:05 AM UTC)

[7a-S103-1]Opening

〇Yukihiro Shimogaki1 (1.The Univ. Tokyo)
10:05 AM - 10:35 AM JST(1:05 AM - 1:35 AM UTC)English Presentation

[7a-S103-2]20 Years of the Korea ALD Workshop: History and Development

〇Hyeongtag Jeon1 (1.Hanyang University)
10:35 AM - 11:05 AM JST(1:35 AM - 2:05 AM UTC)

[7a-S103-3]Development of Semiconductor Deposition Processes Using Machine Learning and Mathematical Models

〇Hirokazu Kyokane1 (1.Tokyo Electron Technology Solutions Ltd.)
11:05 AM - 11:20 AM JST(2:05 AM - 2:20 AM UTC)

[7a-S103-4]Investigation of the steric hindrance effect of CCTBA adsorption in Co-ALD

〇Naoki Tamaoki1, Jun Yamaguchi1, Noboru Sato1, Atsuhiro Tsukune1, Yukihiro Shimogaki1 (1.The Univ. Tokyo)
11:20 AM - 11:35 AM JST(2:20 AM - 2:35 AM UTC)English Presentation

[7a-S103-5]Investigation of Residual Carbon Concentration in Al2O3-ALD
Using Kinetic Monte Carlo Simulation

〇(M2)Yichen ZOU1, Yuxuan Wu1, Jun Yamaguchi1, Noboru Sato1, Atsuhiro Tsukune1, Yukihiro Shimogaki1 (1.The Univ. Tokyo)
11:35 AM - 11:50 AM JST(2:35 AM - 2:50 AM UTC)

[7a-S103-6]Investigation of the Surface State after Oxidant Supply in SiON Films

〇Shogo Shimada1, Mitsuhiro Hakamatsuka1, Atshushi Sano1, Shinaya Hattori1, Satoshi Yabu1, Hajime Karasawa1 (1.KOKUSAI ELECTRIC)
11:50 AM - 12:05 PM JST(2:50 AM - 3:05 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[7a-S103-7]Effect of Ligands of Amino Silane Precursors on SiO2 Growth

〇(D)Yuuki Tsuchiizu1, Teruhisa Otsuka2, Yamazaki Masashi2, Ohori Daisuke1, Endo Kazuhiko1 (1.Tohoku Univ., 2.Natl. Inst. of Adv. Ind. Sci. and Tech.)
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