[7a-S103-1~7] Atomic Layer Process (ALP) analysis and application technologies (2) | The 86th JSAP Autumn Meeting 2025

Session Details

Symposium (Oral)Symposium : Atomic Layer Process (ALP) analysis and application technologies (2)

[7a-S103-1~7]Atomic Layer Process (ALP) analysis and application technologies (2)

Sun. Sep 7, 2025 10:00 AM - 12:05 PM JST
Sun. Sep 7, 2025 1:00 AM - 3:05 AM UTC

S103 (Lecture Hall South)

Takeshi Momose(Kumamoto Univ.), Yukihiro Shimogaki(Univ. of Tokyo)

最先端半導体デバイス製造において重要性が高まる原子層成長（ALD）・エッチング（ALE）を対象に、プロセスサイエンスを中心とした選択性制御、その場観察、原子レベルシミュレーションなどに関する最新研究および将来技術を議論します。午前の部では、2件の招待講演（韓国ALDワークショップの紹介、機械学習を用いた製膜プロセス最適化）を予定しています。

Sponsor

10:00 AM - 10:05 AM JST(1:00 AM - 1:05 AM UTC)

[7a-S103-1]Opening

〇Yukihiro Shimogaki¹ (1.The Univ. Tokyo)

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10:05 AM - 10:35 AM JST(1:05 AM - 1:35 AM UTC)English Presentation

[7a-S103-2]20 Years of the Korea ALD Workshop: History and Development

〇Hyeongtag Jeon¹ (1.Hanyang University)

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10:35 AM - 11:05 AM JST(1:35 AM - 2:05 AM UTC)

[7a-S103-3]Development of Semiconductor Deposition Processes Using Machine Learning and Mathematical Models

〇Hirokazu Kyokane¹ (1.Tokyo Electron Technology Solutions Ltd.)

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11:05 AM - 11:20 AM JST(2:05 AM - 2:20 AM UTC)

[7a-S103-4]Investigation of the steric hindrance effect of CCTBA adsorption in Co-ALD

〇Naoki Tamaoki¹, Jun Yamaguchi¹, Noboru Sato¹, Atsuhiro Tsukune¹, Yukihiro Shimogaki¹ (1.The Univ. Tokyo)

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11:20 AM - 11:35 AM JST(2:20 AM - 2:35 AM UTC)English Presentation

[7a-S103-5]Investigation of Residual Carbon Concentration in Al₂O₃-ALD
Using Kinetic Monte Carlo Simulation

〇(M2)Yichen ZOU¹, Yuxuan Wu¹, Jun Yamaguchi¹, Noboru Sato¹, Atsuhiro Tsukune¹, Yukihiro Shimogaki¹ (1.The Univ. Tokyo)

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11:35 AM - 11:50 AM JST(2:35 AM - 2:50 AM UTC)

[7a-S103-6]Investigation of the Surface State after Oxidant Supply in SiON Films

〇Shogo Shimada¹, Mitsuhiro Hakamatsuka¹, Atshushi Sano¹, Shinaya Hattori¹, Satoshi Yabu¹, Hajime Karasawa¹ (1.KOKUSAI ELECTRIC)

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11:50 AM - 12:05 PM JST(2:50 AM - 3:05 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[7a-S103-7]Effect of Ligands of Amino Silane Precursors on SiO₂Growth

〇(D)Yuuki Tsuchiizu¹, Teruhisa Otsuka², Yamazaki Masashi², Ohori Daisuke¹, Endo Kazuhiko¹ (1.Tohoku Univ., 2.Natl. Inst. of Adv. Ind. Sci. and Tech.)

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