The 86th JSAP Autumn Meeting 2025
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Session Details

Symposium (Oral)Symposium : Atomic Layer Process (ALP) analysis and application technologies (2)

[7a-S103-1~7]Atomic Layer Process (ALP) analysis and application technologies (2)

Sun. Sep 7, 2025 10:00 AM - 12:05 PM JST
Sun. Sep 7, 2025 1:00 AM - 3:05 AM UTC
S103 (Lecture Hall South)
Takeshi Momose(Kumamoto Univ.), Yukihiro Shimogaki(Univ. of Tokyo)
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最先端半導体デバイス製造において重要性が高まる原子層成長（ALD）・エッチング（ALE）を対象に、プロセスサイエンスを中心とした選択性制御、その場観察、原子レベルシミュレーションなどに関する最新研究および将来技術を議論します。午前の部では、2件の招待講演（韓国ALDワークショップの紹介、機械学習を用いた製膜プロセス最適化）を予定しています。
Sponsor
Matlantis T15_TEL T15_PIEZO       ALDJapan 
 TANAKA  KJC  大陽日酸  Chipmetrics
    Horiba    GasPhaseGrowth
   JAC
10:00 AM - 10:05 AM JST(1:00 AM - 1:05 AM UTC)

[7a-S103-1]Opening

〇Yukihiro Shimogaki1 (1.The Univ. Tokyo)
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10:05 AM - 10:35 AM JST(1:05 AM - 1:35 AM UTC)English Presentation

[7a-S103-2]20 Years of the Korea ALD Workshop: History and Development

〇Hyeongtag Jeon1 (1.Hanyang University)
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10:35 AM - 11:05 AM JST(1:35 AM - 2:05 AM UTC)

[7a-S103-3]Development of Semiconductor Deposition Processes Using Machine Learning and Mathematical Models

〇Hirokazu Kyokane1 (1.Tokyo Electron Technology Solutions Ltd.)
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11:05 AM - 11:20 AM JST(2:05 AM - 2:20 AM UTC)

[7a-S103-4]Investigation of the steric hindrance effect of CCTBA adsorption in Co-ALD

〇Naoki Tamaoki1, Jun Yamaguchi1, Noboru Sato1, Atsuhiro Tsukune1, Yukihiro Shimogaki1 (1.The Univ. Tokyo)
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11:20 AM - 11:35 AM JST(2:20 AM - 2:35 AM UTC)English Presentation

[7a-S103-5]Investigation of Residual Carbon Concentration in Al2O3-ALD
Using Kinetic Monte Carlo Simulation

〇(M2)Yichen ZOU1, Yuxuan Wu1, Jun Yamaguchi1, Noboru Sato1, Atsuhiro Tsukune1, Yukihiro Shimogaki1 (1.The Univ. Tokyo)
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11:35 AM - 11:50 AM JST(2:35 AM - 2:50 AM UTC)

[7a-S103-6]Investigation of the Surface State after Oxidant Supply in SiON Films

〇Shogo Shimada1, Mitsuhiro Hakamatsuka1, Atshushi Sano1, Shinaya Hattori1, Satoshi Yabu1, Hajime Karasawa1 (1.KOKUSAI ELECTRIC)
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11:50 AM - 12:05 PM JST(2:50 AM - 3:05 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[7a-S103-7]Effect of Ligands of Amino Silane Precursors on SiO2 Growth

〇(D)Yuuki Tsuchiizu1, Teruhisa Otsuka2, Yamazaki Masashi2, Ohori Daisuke1, Endo Kazuhiko1 (1.Tohoku Univ., 2.Natl. Inst. of Adv. Ind. Sci. and Tech.)
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