Presentation Information
[7p-N102-1]Applications of Helium Ion Microscopy: Defect Engineering for Thin Film Property Control and Device Integration
〇Shinichi Ogawa1 (1.AIST)
Keywords:
helium ion microscopy,ion beam irradiation,defect engineering
Because helium ions have a smaller mass compared to gallium ions, they suppress irradiation damage to materials, enabling high-precision processing and property control. When a thin film is irradiated with a helium ion beam, relatively low doses induce changes in material properties due to atomic disorder and defect formation. Conversely, high doses cause atomic sputtering, leading to an etching phenomenon. This presentation will use graphene, h-BN thin films, and high-temperature superconducting YBCO films as examples to describe the material property changes and etching phenomena brought about by localized helium ion beam irradiation, and will discuss their device applications.