The 86th JSAP Autumn Meeting 2025
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Session Details

Symposium (Oral)Symposium : The cutting edge of charged particle beam for nanotechnology

[7p-N102-1~7]The cutting edge of charged particle beam for nanotechnology

Sun. Sep 7, 2025 1:30 PM - 4:30 PM JST
Sun. Sep 7, 2025 4:30 AM - 7:30 AM UTC
N102 (Lecture Hall North)
1:30 PM - 2:00 PM JST(4:30 AM - 5:00 AM UTC)

[7p-N102-1]Applications of Helium Ion Microscopy: Defect Engineering for Thin Film Property Control and Device Integration

〇Shinichi Ogawa1 (1.AIST)
2:00 PM - 2:30 PM JST(5:00 AM - 5:30 AM UTC)

[7p-N102-2]Low-temperature Crystallization Technology Using Ion Irradiation and Applications

〇Noriaki IKENAGA1, Noriyuki SAKUDO1 (1.Kanazawa Inst. of Technol.)
2:30 PM - 3:00 PM JST(5:30 AM - 6:00 AM UTC)

[7p-N102-3]Electron Beam Lithography in the R&D of Silicon Qubit Integration Technology

Kimihiko Kato1, 〇Takahiro Mori1 (1.AIST)
3:00 PM - 3:30 PM JST(6:00 AM - 6:30 AM UTC)

[7p-N102-4]High Spatial Resolution Microscopy Using an Electron-Beam-Excited Probe and Its Applications

〇Yu Masuda1,3, Wataru Inami1,3, Yoshimasa Kawata2,3 (1.Shizuoka Univ. ENG, 2.Shizuoka Univ. RIE, 3.JST-CREST)
3:30 PM - 4:00 PM JST(6:30 AM - 7:00 AM UTC)

[7p-N102-5]Three-dimensional Dose Distribution in Electron Beam Lithography and Its Application to Control of Resist Cross Section Shapes

〇Tatsuki Sugihara1, Arata Kaneko2 (1.ELIONIX INC., 2.Tokyo Met. Univ.)
4:00 PM - 4:15 PM JST(7:00 AM - 7:15 AM UTC)

[7p-N102-6]Oblique incidence angle electron beam lithography for fabricating slanted diffraction grating and NIL

〇Naoya Shibasaki1, Jun Taniguchi1 (1.Tokyo Univ. of Sci.)
4:15 PM - 4:30 PM JST(7:15 AM - 7:30 AM UTC)

[7p-N102-7]Fabrication of near-infrared anti-reflection films by RIE and NIL

〇(M1C)Kei Hirata1, Jun Taniguchi1 (1.Tokyo Univ. of Sci.)
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