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[7p-N102-6] Oblique incidence angle electron beam lithography for fabricating slanted diffraction grating and NIL

〇Naoya Shibasaki¹, Jun Taniguchi¹ (1.Tokyo Univ. of Sci.)

Keywords:

electron beam lithography,nano imprint lithography

In recent years, augmented reality (AR) glasses and other head-mounted displays have enriched our lives. These devices use slanted diffraction gratings on the glasses' surface to provide information to the wearer. The manufacturing process involves several steps, including dry etching at an angle after electron beam lithography (EBL). For this study, we performed EBL with the sample tilted at a 45-degree angle to create a slanted diffraction grating mold. Then, we transferred the mold using UV-NIL.