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[7p-N102-7] Fabrication of near-infrared anti-reflection films by RIE and NIL

〇(M1C)Kei Hirata¹, Jun Taniguchi¹ (1.Tokyo Univ. of Sci.)

Keywords:

nanostructure,antireflection,near infrared

Using reactive ion etching, it is possible to create a moth-eye structure, which is an anti-reflective structure. By using this as a mold for nanoimprint lithography, it is possible to obtain a film with low reflectance and high transmittance. By increasing the height of the moth-eye structure on the film thus produced, it is possible to achieve a reflectance of about 1% for not only visible light, but also near-infrared light.