[7p-P01-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[7p-P01-13] Evaluation of surface damage on plasma-irradiated semiconductor substrates using a light scattering wafer surface inspection device.

〇(M1)Yuya Yamamoto¹, Kento Imai¹, Kazunobu Asakawa², Kunio Fukatsu², Yohei Otani³, Tetsuya Sato¹ (1.Univ. of Yamanashi, 2.YGK Co., Ltd., 3.Suwa Univ. of Sci.)

Keywords:

Particle Scanner,GeO2,defect