The 86th JSAP Autumn Meeting 2025
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Session Details

Poster presentation8 Plasma Electronics : 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[7p-P01-1~15]8.2 Plasma deposition of thin film, plasma etching and surface treatment

Sun. Sep 7, 2025 1:30 PM - 3:30 PM JST
Sun. Sep 7, 2025 4:30 AM - 6:30 AM UTC
P01 (Gymnasium)

[7p-P01-1]Plasma Simulation of the Self-Ionized Sputtering

〇Susumu Isono1, Shintaro Tamiya1, Masaya Watanabe1, Michiro Isobe2, Satoshi Hamaguchi2 (1.ULVAC, Inc., 2.Osaka Univ.)

[7p-P01-2]Numerical Analysis of Basic Characteristics of Capacitively-coupled RF CO Plasma for Hydrogen-Free DLC Films Deposition

〇(M2)Tatsuya Takiguchi1, Toru Harigai2, Hiroyuki Kousaka2, Akinori Oda1 (1.Chiba Tech., 2.Gifu Univ.)

[7p-P01-3]Rate theory for SiCxNyOz thin film formation by room temperature PECVD

〇Hitoshi Habuka1 (1.Yokohama Nat. Univ.)

[7p-P01-4]Physical and chemical characteristics at interface in a-C:H/CNP/a-C:H structure films

〇Shinjiro Ono1, Takamasa Okumura1, Kunihiro Kamataki1, Kazunori Koga1, Masaharu Shiratani1 (1.Kyushu Univ.)

[7p-P01-5]Preparation of the gradient Fe, Mo element functional thin film using powder mixture target process

〇Hiroharu Kawasaki1, Takahiko Satake1,2, Akihiro Ikeda2, Toru Sasaki3, Takashi Kikuchi3 (1.Nat,l Ins. Tech., Sasebo Col., 2.Sojo Univ., 3.Nagaoka Univ.)

[7p-P01-6]Fabrication of nanostructured Sn-based thin films by medium pressure sputtering and their application to the anode of Li-ion batteries

〇Yoshiyuki Hasegawa1, Tatsuo Ueda1, Keigo Terada1, Daiki Fujikake1, Ryuta Murase1, Ryosuke Yamazaki1, Koki Sakaguchi1, Giichiro Uchida1 (1.Meijo Univ.)

[7p-P01-7]Ionic conductivity evaluation of LiLaZrO thin films deposited in an ion sputtering process

〇Ryuta Murase1, Tatsuo Ueda1, Keigo Terada1, Yoshiyuki Hasegawa1, Daiki Fujikake1, Ryosuke Yamazaki1, Koki Sakaguchi1, Giichiro Uchida1 (1.Meijo Univ.)

[7p-P01-8]Deposition of Ge-Si Thin Films by Dual-Source Sputtering and Application for Lithium-ion Batteries

〇Daiki Fujikake1, Tatsuo Ueda1, Keigo Terada1, Yoshiyuki Hasegawa1, Ryuta Murase1, Ryosuke Yamazaki1, Koki Sakaguchi1, Giichiro Uchida1 (1.Meijo Univ.)

[7p-P01-9]Si-based separation membrane fabrication by atmospheric pressure plasma CVD

〇(M1)Ikki Kojima1, Norihiro Moriyama1, Masakoto Kanezashi1, Hiroki Nagasawa1 (1.Hiroshima Univ.)

[7p-P01-10]Physical and Chemical Effects of Atmospheric-Pressure Non-Equilibrium RF Plasma Jet Treatment on Surface of Polyetheretherketone

〇Kosuke Takenaka1, Soutaro Nakamoto1, Masaya Shimabukuro2, Akiya Jinda1, Ryosuke Koyari1, Shunsho Shigemori1, Kouki Ueno1, Susumu Toko1, Giichiro Uchida3, Masakazu Kawashita2, Yuichi Setsuhara1 (1.Osaka Univ., 2.Science Tokyo, 3.Meijo Univ.)

[7p-P01-11]Polymer Surface Modification Using Atmospheric Pressure Microplasmas

〇JunSeok Oh1, Fumiya Taniguchi1, Hiroto Mori1, Tatsuru Shirafuji1, Akimitsu Hatta2 (1.Osaka Metropol Univ, 2.Kochi Univ Technol)

[7p-P01-12]Direct Bonding of PET Films Using Vacuum Plasma Surface Modification and Evaluation of Optical Properties

〇(M2)Takumi Koyama1, Satoshi Sugimura2, Kei Matsuura2, Kenji Hirakuri1, Kazuya Kanasugi1 (1.Tokyo Denki Univ., 2.KASUGA DENKI, INC.)

[7p-P01-13]Evaluation of surface damage on plasma-irradiated semiconductor substrates using a light scattering wafer surface inspection device.

〇(M1)Yuya Yamamoto1, Kento Imai1, Kazunobu Asakawa2, Kunio Fukatsu2, Yohei Otani3, Tetsuya Sato1 (1.Univ. of Yamanashi, 2.YGK Co., Ltd., 3.Suwa Univ. of Sci.)

[7p-P01-14]Effects of Pulse Voltage Waveform Changes in PEO Coatings

〇Syu Umeda1, Yuichiro Takemura1 (1.Kindai Univ.)

[7p-P01-15]Evaluation of plasma etching resistance of Si and carbon-based materials

〇(M1)Junichi Toyoda1, Takafumi Noguchi2, Toshihiro Iizuka2, Tetsuya Sato1 (1.Univ.of Yamanashi, 2.Samsung Japan Co.)
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