[7p-P01-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[7p-P01-15] Evaluation of plasma etching resistance of Si and carbon-based materials

〇(M1)Junichi Toyoda¹, Takafumi Noguchi², Toshihiro Iizuka², Tetsuya Sato¹ (1.Univ.of Yamanashi, 2.Samsung Japan Co.)

Keywords:

Low-temperature etching,Capacitively Coupled Plasma,Diamond-Like Carbon