[7p-P01-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[7p-P01-4] Physical and chemical characteristics at interface in a-C:H/CNP/a-C:H structure films

〇Shinjiro Ono¹, Takamasa Okumura¹, Kunihiro Kamataki¹, Kazunori Koga¹, Masaharu Shiratani¹ (1.Kyushu Univ.)

Keywords:

plasma CVD,carbon nanoparticle,stress reduction