Presentation Information
[7p-P02-1]Optical Transparency of Ultra-hydrophobic SiO:CH Particule-deposited Films Deposited by PECVD
〇Mayuki Nisio1, Yasushi Inoue1, Osamu Takai2 (1.Chiba Inst. Technol., 2.SSAME)
Keywords:
plasma CVD,Silica with organic groups,plasma polymerization
SiO:CH particulate films with a surface microcavity structure were formed by depositing SiO:CH particulates generated by plasma polymerization. SiO:CH particles were formed at all RF powers, and superhydrophobicity was observed. As the RF power increased, the particle size became smaller, the reflectivity increased, and the spectral oscillation due to interference became clearer. This is considered to be due to the fact that the particle size of the fine particles became smaller, and the film became optically closer to a continuous film.