[7p-P02-1~5] 8.3 Plasma nanotechnology | The 86th JSAP Autumn Meeting 2025

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Session Details

Poster presentation8 Plasma Electronics : 8.3 Plasma nanotechnology

[7p-P02-1~5]8.3 Plasma nanotechnology

Sun. Sep 7, 2025 1:30 PM - 3:30 PM JST
Sun. Sep 7, 2025 4:30 AM - 6:30 AM UTC

P02 (Gymnasium)

[7p-P02-1]Optical Transparency of Ultra-hydrophobic SiO:CH Particule-deposited Films Deposited by PECVD

〇Mayuki Nisio¹, Yasushi Inoue¹, Osamu Takai² (1.Chiba Inst. Technol., 2.SSAME)

[7p-P02-2]Formation of a Cap Layer to Prevent Carbonation in SiO:CH/Li Thin Films

Kouki Watanabe¹, 〇Haruna Abe¹, Yasushi Inoue¹, Osamu Takai² (1.Chiba Inst. Technol., 2.SSAME)

[7p-P02-3]Hydrogen Shielding Effect of Ti Sputtered Film on High Strength Steel

Yoma Sase¹, 〇Mihiro Shimada¹, Yasushi Inoue¹, Shunpei Ozawa¹, Daisuke Terada¹ (1.Chiba Inst. Technol.)

[7p-P02-4]Development of Li ion battery with Si nanoparticle anode covered by sputtered thin film

〇Keigo Terada¹, Tatsuo Ueda¹, Daiki Fujikake¹, Yoshiyuki Hasegawa¹, Ryuta Murase¹, Ryosuke Yamazaki¹, Koki Sakaguchi¹, Giichiro Uchida¹ (1.Meijo Univ.)

[7p-P02-5]Characterization of ternary Si nanowire thin films and their application to the anode of Li-ion batteries

〇Ryosuke Yamazaki¹, Tatsuo Ueda¹, Terada Keigo¹, Yoshiyuki Hasegawa¹, Daiki Fujikake¹, Ryuta Murase¹, Koki Sakaguchi¹, Giichiro Utida¹ (1.Meijo Univ.)

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