Presentation Information
[7p-S103-3]Process monitoring of deposition by in-situ spectroscopic ellipsometer
〇Jyunya Takashima1 (1.J.A.Woollam Japan)
Keywords:
ellipsometer,thickness,optical constant
Spectroscopic ellipsometry is a technique that analyzes the polarization state of light to non-destructively and accurately evaluate the thickness and optical properties of thin films. By measuring changes in the polarization of reflected light from the sample surface and performing model-based analysis, parameters such as film thickness, refractive index, and extinction coefficient can be determined. Particularly when used for in-situ measurements, it enables real-time monitoring of the film deposition process, contributing to precise thickness control and quality improvement. This presentation will introduce the fundamental principles, measurement techniques, and applications of this technology in process evaluation.