[7p-S202-1~12] 23.1 Joint Session N "Informatics"

3:00 PM - 3:15 PM JST(6:00 AM - 6:15 AM UTC)

[7p-S202-8] Development of a Bimodal Correlative Microscopy Method Using Three-Dimensional Atom Probe and Transmission Electron Microscopy Analysis

〇Zentaro Akase¹, Taisei Bessho¹, Yoshito Otake¹, Jun Uzuhashi², Kazunori Iwamitsu¹, Hiroshi Nakajima³, Jun Yamasaki³, Tadakatsu Ohkubo², Shigetaka Tomiya¹ (1.NAIST, 2.NIMS, 3.Osaka Univ.)

Keywords:

three-dimensional atom probe,transmission electron microscopy,non-rigid registration

With the continued miniaturization of advanced semiconductor devices, precise three-dimensional analysis of trace impurity distributions has become increasingly important. In this study, we propose a correlative microscopy approach that combines three-dimensional atom probe (3DAP) and electron tomography (ET). To address structural distortions inherent in 3DAP reconstructions, we employ non-rigid registration using ET data as a geometric reference. Furthermore, to enable visualization of concentration differences among identical atomic species, we introduce a new modality conversion technique based on Gaussian blurring. This method improves the gradient correlation metric by approximately a factor of two, demonstrating enhanced accuracy in cross-modal alignment.