[8a-N105-1~10] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

9:15 AM - 9:30 AM JST(12:15 AM - 12:30 AM UTC)

[8a-N105-2] Deposition of indium oxide film using high-power impulse magnetron sputtering

〇Daiki Horikawa¹, Kosuke Takenaka², Yuichi Setsuhara², Takayuki Ohta¹ (1.Meijo Univ., 2.Osaka Univ.)

Keywords:

oxide semiconductor,indium oxide,high-power impulse magnetron sputtering