Presentation Information

[8a-N201-5]Effects of In-plane Orientation and Lattice Strain on Switching Properties in (Al,Sc)N Ferroelectric Thin Films

〇Shunpei Kawano1, Kazuki Okamoto1, Sotaro Kageyama1, Nana Sun1, Shinosuke Yasuoka1, Hiroshi Funakubo1 (1.Science Tokyo)

Keywords:

Ferroelectric materials,Thin film

Ferroelectric (Al,Sc)N thin films offer several advantages, such as high remanent polarization, in addition to excellent compatibility with CMOS processes. However, a major challenge remains the high coercive field required for polarization switching. To address this issue, it is important to investigate the switching characteristics of ferroelectric (Al,Sc)N thin films, and active research is underway in this area. In this study, we fabricated uniaxially oriented films on various substrates and compared them with epitaxial films to investigate the effects of lattice strain and in-plane orientation on the switching characteristics.