Presentation Information
[8p-N105-2]Mechanism of high-quality AlOx thin film formation at 350℃ in mist CVD Ⅰ
〇Toshiyuki Kawaharamura1, Miyabi Fukue1, Li Liu1, T. Giang DANG1, Toshinobu FUJIMURA2 (1.Kochi Univ. of Tech., 2.NOF Corporation)
Keywords:
mist CVD,AlOx,Mechanism